3 stories · “asml”.
CXMT said on 20 September 2026 that its fifth-generation DRAM platform is in mass production, using quadruple patterning to reach an 11.95nm array half-pitch without EUV.
Intel says it has processed more than a million High-NA EUV wafers, roughly three-quarters of the world total, as TSMC and Samsung sign on to the mask standard it championed.
Extreme ultraviolet lithography uses 13.5 nm light from tin plasma to print the smallest chip layers. How EUV works, what it costs, and why ASML controls it.
